|
|
ANALYTICAL ELECTRON MICROSCOPY OF DILUTED CU-CO ALLOYS
Buršík, Jiří ; Svoboda, Milan
The work is focused on characterization of diluted model Cu-Co alloys with Co content from 2 to 4 wt.% after various thermal treatment. After initial annealing at 1273 K followed by water cooling, further annealing of the oversaturated solid solution in the range 773 to 1073 K generated a fine distribution of Co-rich precipitates. Parameters of microstructure were characterized by means of transmission electron microscopy with energy dispersive X-ray analysis.
|
|
|
MICROSTRUCTURAL INVESTIGATION AND MECHANICAL TESTING OF AN ULTRAFINE-GRAINED AUSTENITIC STAINLESS STEEL
Chlupová, Alice ; Man, Jiří ; Polák, Jaroslav ; Karjalainen, L. P.
Special thermomechanical treatment based on high degree deformation followed by reversion annealing was applied to 301LN austenitic stainless steel to achieve ultrafine-grained (UFG) structure with considerably enhanced mechanical properties. Two different conditions of the thermomechanical treatment were adopted and resulting microstructures with different grain sizes were characterised by optical and high resolution scanning electron microscopy (FEG SEM). Hardness measurements and tensile tests were performed to characterize mechanical properties. To reveal structural changes induced during thermomechanical treatment and during tensile tests a magnetic induction method was additionally applied. Experimental study validated the ability of the treatment to produce an austenitic stainless steel with the grain size of about 1.4 mu m which exhibits tensile strength of around 1000 MPa while ductility remains close to 60 %. The results obtained for both thermomechanical conditions are compared and the relationship between microstructure refinement, phase content and mechanical properties is discussed.
|
|
|
MICROSTRUCTURAL INVESTIGATION AND MECHANICAL TESTING OF AN ULTRAFINE-GRAINED AUSTENITIC STAINLESS STEEL
Chlupová, Alice ; Man, Jiří ; Polák, Jaroslav ; Karjalainen, L. P.
Special thermomechanical treatment based on high degree deformation followed by reversion annealing was applied to 301LN austenitic stainless steel to achieve ultrafine-grained (UFG) structure with considerably enhanced mechanical properties. Two different conditions of the thermomechanical treatment were adopted and resulting microstructures with different grain sizes were characterised by optical and high resolution scanning electron microscopy (FEG SEM). Hardness measurements and tensile tests were performed to characterize mechanical properties. To reveal structural changes induced during thermomechanical treatment and during tensile tests a magnetic induction method was additionally applied. Experimental study validated the ability of the treatment to produce an austenitic stainless steel with the grain size of about 1.4 mu m which exhibits tensile strength of around 1000 MPa while ductility remains close to 60 %. The results obtained for both thermomechanical conditions are compared and the relationship between microstructure refinement, phase content and mechanical properties is discussed.
|
|
|
Nanopositioning with detection of a standing wave
Holá, M. ; Hrabina, J. ; Číp, O. ; Fejfar, Antonín ; Stuchlík, Jiří ; Kočka, Jan ; Oulehla, J. ; Lazar, J.
A measuring technique is intended for displacement and position sensing over a limited range with detection of standing-wave pattern inside of a passive Fabry-Perot cavity. In this concept we consider locking of the laser optical frequency and the length of the Fabry-Perot cavity in resonance. Fixing the length of the cavity to e.g. a highly stable mechanical reference allows stabilizing wavelength of the laser in air and thus to eliminate especially the faster fluctuations of refractive index of air due to air flow and inhomogeneity. Detection of the interference maxima and minima within the Fabry-Perot cavity along the beam axis has been tested and proven with a low loss transparent photodetector with very low reflectivity. The transparent photodetector is based on a thin polycrystalline silicon layer. Reduction of losses was achieved thanks to a design as an optimized set of interference layers acting as an antireflection coating. The principle is demonstrated on an experimental setup.
|
|
|
Monte-Carlo simulation of proximity effect in e-beam lithography
Urbánek, Michal ; Kolařík, Vladimír ; Krátký, Stanislav ; Matějka, Milan ; Horáček, Miroslav ; Chlumská, Jana
E–beam lithography is the most used pattern generation technique for academic and research prototyping. During this patterning by e–beam into resist layer, several effects occur which change the resolution of intended patterns. Proximity effect is the dominant one which causes that patterning areas adjacent to the beam incidence point are exposed due to electron scattering effects in solid state. This contribution deals with Monte Carlo simulation of proximity effect for various accelerating beam voltage (15 kV, 50 kV, 100 kV), typically used in e–beam writers. Proximity effect simulation were carried out in free software Casino and commercial software MCS Control Center, where each of electron trajectory can be simulated (modeled). The radial density of absorbed energy is calculated for PMMA resist with various settings of resist thickness and substrate material. At the end, coefficients of proximity effect function were calculated for beam energy of 15 keV, 50 keV and 100 keV which is desirable for proximity effect correction.
|
|
|
Comparison of ultimate resolution achieved by e-beam writers with shaped beam and with Gaussian beam
Krátký, Stanislav ; Kolařík, Vladimír ; Matějka, Milan ; Urbánek, Michal ; Horáček, Miroslav ; Chlumská, Jana
This contribution deals with the comparison of two different e–beam writer systems. E–beam writer with rectangular shaped beam BS600 is the first system. This system works with electron energy of 15 keV. Vistec EBPG5000+ HR is the second system. That system uses the Gaussian beam for pattern generation and it can work with two different electrons energies of values 50 keV and 100 keV. The ultimate resolution of both systems is the main aspect of comparison. The achievable resolution was tested on patterns consisted of single lines, single dots (rectangles for e–beam writer with shaped beam) and small areas of periodic gratings. Silicon wafer was used as a substrate for resist deposition. Testing was carried out with two resists, PMMA as a standard resist for electron beam lithography, and HSQ resist as a material for ultimate resolution achievement. Process of pattern generation (exposition) is affected by the same undesirable effect (backscattering and forward scattering of electrons, proximity effect etc.). However, these effects contribute to final pattern (resolution) by various dispositions. These variations caused the different results for similar conditions (the same resist, dose, chemical developer etc.). Created patterns were measured and evaluated by using of atomic force microscope and scanning electron microscope.
|
|
|
Lift-Off technique using different e-beam writers
Chlumská, Jana ; Kolařík, Vladimír ; Krátký, Stanislav ; Matějka, Milan ; Urbánek, Michal ; Horáček, Miroslav
This paper deals with lift–off technique performed by the way of electron beam lithography. Lift–off is a technique mainly used for preparation of metallic patterns and unlike etching it is an additive technique using a sacrificial material – e.g. e–beam resist PMMA. In this paper we discussed technique of preparation of lift–off mask on two different e–beam writing systems. The first system was BS600 – e–beam writer with rectangular variable shaped beam working with 15keV. The second system was Vistec EBPG5000+ HR – e–beam writer with Gaussian shape beam working with 50 keV and 100 keV. The PMMA resist single layer and bi–layer was used for the lift–off mask preparation. As a material for creation of metallic pattern, magnetron sputtered chromium was used. Atomic force microscope, scanning electron microscope and contact profilometer were used to measure and evaluate the results of this process.
|
|
|
The Synthesis, Surface Modification and Stability of SPIO Nanoparticles for MRI Application
Kovář, D. ; Fohlerová, Z. ; Malá, A. ; Jiřík, Radovan ; Starčuk jr., Zenon ; Kalina, M. ; Skládal, P.
The biocompatibility and biodegradability of new magnetic resonance imaging (MRI) contrast agents is high-ly desired. The superparamagnetic iron oxide (SPIO) nanoparticles are suitable candidates for these pur-poses. Here the co-precipitation technique for synthesis of monodispersed SPIO nanoparticles is pre-sented. The critical point of the synthesis is core formation and consequent crystal growth. The conditions for core formation (time, temperature, rate of base addition) were optimised. The nanoparticles were stabilised by either silanisation or polymer coating (cationic chitosan, poly-D-Arg, dextran, gelatine, hyaluronic acid). The stability was investigated in physiological pH, different ionic strength solutions, PBS-albumine solution or blood plasma. The biocompatibility was tested in vitro either in the presence of Saccharomyces cerevisiae or erythrocytes suspension. The size and shape was investigated by atomic force microscopy (AFM) and scanning electron microscopy (SEM). The molecular structures of nanoparticles were investigated by FTIR (Fourier transform infrared spectroscopy). The iron cations were determined using the Prussian blue staining test. The stability of nano-particles was investigated by the zeta potential using the method of electrophoretic light scattering (ELS).
|
|
|
ANALYTICAL ELECTRON MICROSCOPY OF DILUTED CU–CO ALLOYS
Buršík, Jiří ; Svoboda, Milan
The work is focused on characterization of diluted model Cu–Co alloys with Co content from 2 to 4 wt.% after various thermal treatment. After initial annealing at 1273 K followed by water cooling, further annealing of the oversaturated solid solution in the range 773 to 1073 K generated a fine distribution of Co-rich precipitates. Parameters of microstructure were characterized by means of transmission electron microscopy with energy dispersive X-ray analysis.
|
|
|
NANOSTRUCTURE CHARACTERIZATION OF IN738LC SUPERALLOY FATIGUED AT HIGH TEMPERATURE
Petrenec, M. ; Strunz, Pavel ; Gasser, U. ; Heczko, Milan ; Zálešák, J. ; Polák, Jaroslav
The nanostructure of Inconel 738LC Ni-superalloy strengthened by trimodal γ’ precipitates distribution was investigated after Low Cycle Fatigue (LCF) loading at temperature 700°C. Different microscopic techniques as Scanning Electron Microscope (SEM) equipped with STEM detector, transmission Kikuchi diffraction in the SEM, transmission electron microscope (TEM) in the bright field mode and high resolution transmission electron microscopes in STEM mode were used for the characterization of nanostructure. The characteristic morphology of γ’ precipitates was examined by ex-situ and in-situ Small Angle Neutron Scattering (SANS) at high temperatures. All microscopic techniques indicate that the morphology of γ’ precipitates distributed in the γ matrix as received state corresponds to two types, i.e. large cuboid-like precipitates with the size around 670 nm, and the spherical precipitates with the diameter 52 nm. After the LCF tests at temperature 700°C, the ex-situ SANS measurement yielded additional scattering intensities coming from another small γ’ precipitates with estimated size up to 10 nm.
|
guest ::
